| 物理气相沉积设备（PVD）Physical Vapor Deposition Equipment (PVD) |
1.多弧离子镀系统 | Multi-Arc Ion Plating System
A. 全自动多弧离子镀膜机 Full-Automatic Multi-Arc Ion Plating Machine | B. 纳米多层膜沉积系统 Nano-Multilayer Film Deposition System |
C. 彩色PVD装饰镀膜生产线 Color PVD Decorative Coating Production Line | D. 智能化刀具镀膜专用 Specialized for Intelligent Cutting Tool Coating |
2.磁控溅射系统 | Magnetron Sputtering System
A. 超高真空磁控溅射系统 Ultra-High Vacuum Magnetron Sputtering System | B. 大面积均匀镀膜溅射机 Large-Area Uniform Coating Sputtering Machine |
C. 共溅射复合薄膜沉积系统 Co-Sputtering Composite Film Deposition System | D. 低温溅射镀膜设备 Low-Temperature Sputtering Coating Equipment |
3.蒸发镀膜系统 | Evaporation Coating System
A.多源电子束蒸发系统 Multi-Source Electron Beam Evaporation System | B.分子束外延生长系统 Molecular Beam Epitaxy Growth System |
C.有机材料蒸发镀膜机 Organic Material Evaporation Coating Machine | D.大尺寸基板蒸发系统 Large-Size Substrate Evaporation System |
| 化学气相沉积设备（CVD）Chemical Vapor Deposition Equipment (CVD) |
1. 热壁式CVD系统 Hot-Wall Chemical Vapor Deposition (CVD) System | 2. 冷壁式CVD系统 Cold-Wall Chemical Vapor Deposition (CVD) System |
3. 原子层沉积（ALD）设备 Atomic Layer Deposition (ALD) Equipment | 4. 激光化学气相沉积系 Laser Chemical Vapor Deposition System |
5. 金属有机物CVD系统 Metal-Organic Chemical Vapor Deposition (MOCVD) System |
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| 特种镀膜设备Special Coating Equipment |
1. 离子镀与磁控溅射复合系统 Ion Plating and Magnetron Sputtering Composite System | 2. 离子束沉积设备 Ion Beam Deposition Equipment |
3. 电弧离子镀与PECVD复合系统 Arc Ion Plating and PECVD Composite System | 4. 卷对卷柔性基材镀膜生产线 Roll-to-Roll Flexible Substrate Coating Production Line |
| 复合镀膜设备（部分）Composite Coating Equipment (Partial) |
1. PVD+CVD复合镀膜系统 pvd+cvd hybrid coating system | 2. 离子束辅助沉积系统 Ion Beam Assisted Deposition System |
3. 磁过滤电弧沉积系统 Magnetically Filtered Arc Deposition System | 4. CVD+ALD复合镀膜系统 CVD + ALD Hybrid Coating System |
5. PVD+ALD复合镀膜系统 PVD + ALD Hybrid Coating System |
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